关于我们

教育背景
1998.9 -2002.7  山东大学 信息科学与工程学院    学士
2003.9 -2009.7  中国科学院微电子研究所         博士
工作简历
2009.7 –至今  中国科学院微电子研究所

高k栅介质/金属栅技术

1. Gaobo Xu, Qiuxia Xu, Thermal stability of HfON, HfSiON and HfTaON gate dielectrics, 9th International Conference on Solid-State and Integrated-Circuit Technology Proceedings, 2008, 1284-1287
2. Gaobo Xu, Qiuxia Xu, Characteristics of high-quality HfSiON gate dielectric prepared by physical vapor deposition, Chinese Physics B, 2009, 18 (2): 768-772
3. Gaobo Xu, Qiuxia Xu, Thermal stability of HfTaON films prepared by physical vapor deposition, Journal of Semiconductors, 2009, 30 (2): 023002
4. Gaobo Xu, Qiuxia Xu, Characteristics of HfSiAlON Gate Dielectric Prepared by Physical Vapor Deposition, ECS Transactions, 2011, 34 (1) : 495-501