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  • 姓名: 刘凡宇
  • 性别: 男
  • 职称: 副研究员
  • 职务: 
  • 学历: 博士
  • 电话: 82995522
  • 传真: 
  • 电子邮件: liufanyu@ime.ac.cn
  • 所属部门: 硅器件与集成研发中心
  • 通讯地址: 北京市朝阳区北土城西路3号

    简  历:

  • 教育背景:

    20011.9-2015.9:法国格勒诺布尔-阿尔卑斯大学,博士; 

    2004.9-2008.6:四川大学微电子系,本科。 

    工作简历: 

    2019.12至今:中国科学院微电子研究所,副研究员; 

    社会任职:

  •  

    研究方向:

  • 模拟集成电路设计、器件和电路可靠性、SOI材料与器件表征与建模

    承担科研项目情况:

  • 1.  2020-2022,国家自然科学基金青年项目,“三维单片集成SRAM重离子单粒子效应研究”,1190528724万,在研,主持; 

    2.  2021-2022,硅器件重点实验室基金,“三维单片集成组合电路单粒子软错误研究”,80万,主持; 

    3.  2020-2022,高技术项目,“SOI FinFET新结构器件研究”,200万元,在研,骨干人员; 

    4.  国家自然科学基金重点项目“集成电路辐照效应与抗辐照技术研究”,200万,结题,参与; 

    5.  国家自然科学基金“纳米级集成电路SET软错误率分析技术研究”,No. 6100607020万,结题,参与。

    代表论著:

  • 期刊 

    1. R. Cheng, Y. Sun, Y. M. Qu, W. Liu, F. Y. Liu, J. F Gao, B. Chen, N. Xu and J. W. Lu, Nano-scaled Transistor's Performance and Reliability Characterization at Nano-second Regime, Science China Information Sciences, 2020(已接收). 

    2. 张峰源,刘凡宇,李博,李彬鸿,张旭,罗家俊,韩郑生,张青竹“考虑背栅偏置的FOI FinFET电流模型研究,”《半导体技术》,2020(已接收). 

    3. 张峰源,李博,刘凡宇,杨灿,黄杨,张旭,罗家俊,韩郑生,“FinFET总剂量效应研究进展,”《微电子学》,2020(已接收). 

    4. Y. D. Li, Q. Z. Zhang, F. Y. Liu, Z. H. Zhang, F. Y. Zhang, H. B. Zhao, Bo Li and J. Yan, “X-ray Irradiation Induced Degradation in Hf0.5Zr0.5O2 FDSOI nMOSFETs,” Rare Metals, 2020 (accepted). 

    5. J. T. Gao, Q. Zhang, B. Li, K. Xi, Bo. Li, F. Y. Liu, F. Z. Zhao, C. B. Zeng, J. J. Luo, Z. S. Han and Gang. Guo, “Proton and light ions induced SEU effect in a SOI SRAM with gold plated lid,” Microelectronics Reliability, 100-101, 2019. 

    6. M. S. Parihar, F. Y. Liu, C. Navarroa, S. Barraud, M. Bawedin, I. Ionica, A. Kranti and S. Cristoloveanu, “Back-gate effects and mobility characterization in junctionless transistor,” Solid-State Electronics, vol. 125, pp. 154~160, 2016. 

    7. F. Y. Liu, H. Z. Liu, B. W. Liu and Y. F. Guo, “An analytical model for nanowire junctionless SOI FinFETs considering three-dimensional coupling effect,” Chin. Phys. B, vol. 25, no. 4, pp. 047305, 2016. 

    8. F. Y. Liu, I. Ionica, M. Bawedin and S. Cristoloveanu, “Parasitic bipolar effect in ultra-thin FD SOI MOSFETs,” Solid-State Electronics, vol. 112, pp. 29~36, 2015. 

    9. F. Y. Liu, I. Ionica, M. Bawedin and S. Cristoloveanu, “Extraction of the Parasitic Bipolar Gain Using the Back-gate in Ultra-thin FD SOI MOSFETs,” IEEE Elec. Dev. Lett., vol. 32, no. 2, pp. 96~98, 2015. 

    10. B. W. Liu and F. Y. Liu, “TCAD Simulation Study of the Single-Event Effects in Silicon nanowire Transistors,” IEEE Trans. Dev and Mat. Reli., vol. 15, no. 2, pp. 410~416, 2015. 

    11. S-J. Chang, M. Bawedin, Y. F. Guo, F. Y. Liu, K. Akarvardar, J-H. Lee, J-H. Lee, I. Ionica and S. Cristoloveanu, “Enhanced coupling effects in vertical double-gate FinFETs,” Solid-State Electronics, vol. 97, pp. 88~98, 2014. 

    12. F. Y. Liu, A. Diab, I. Ionica, K. Akarvardar, C. Hobbs, T. Ouisse, X. Mescot and S. Cristoloveanu, “Characterization of Heavily Doped SOI wafers under Pseudo-MOSFETs Configuration,” Solid-State Electronics, vol. 90, pp.65~72, 2013. 

    13. F. Y. Liu, H. Z. Liu, B. Liang, B. W. Liu, J. J. Chen. “Impact of Doping Concentration in P+ Deep Wells on Charge Sharing in 90nm CMOS Technology,” Acta Physica Sinica, vol. 60, no.4, pp. 046106-1~046106-8, 2011. 

    14. H. Z. Liu, F. Y. Liu, B. Liang, B. W. Liu, “Impact of STI Depth on Charge Sharing in 90nm CMOS Technology,” Journal of National University of Defense Technology, vol. 33, no. 2, pp. 136~139, 2011. 

    15. J. R. Qin, S. M. Chen, B. W. Liu, F. Y. Liu and J. J. Chen, “The Effect of P+ Deep Well Doping on SET Pulse Propagation,” Science China Technological Sciences, vol. 55, no. 3, pp. 665~672, 2012. 

    16. J. J. Chen, S. M. Chen, B. Liang and F. Y. Liu, “Single Event Transient Pulse Attenuation Effect In Three Transistors Inverter Chain,” Science China Technological Sciences, vol. 55, pp. 867~871, 2012. 

    17. J. J. Chen, S. M. Chen, B. Liang and F. Y. Liu, “Radiation Hardened by Design Techniques to Reduce Single Event Transient Pulse Width Based on the Physical Mechanism,” Microelectronic Reliability, vol. 52, no. 6, pp. 1227~1232, 2012. 

    18. S. M. Chen, J. J. Chen, Y. Q. Chi and F. Y. Liu, Y. B. He. “Modeling to predict the time evolution of negative bias temperature instability (NBTI) induced single event transient pulse broadening,” Science China Technological Sciences, vol. 55, no. 4, pp. 1101~1106, 2012. 

    会议 

    1. J. J. Zhang, F. Y. Liu, B. Li, B. H. Li, Y. Huang, C. Yang, G. Q. Wang, R. W. Wang, J. J. Luo and Z. S. Han, “Temperature dependence of single event upset of monolithic 3-D integrated 6T SRAM based on a 22 nm FD-SOI technology,” ESREF 2020 (accepted). 

    2. Y. X. Chen, J. Liu, K. Xiao, A. Zaslavsky, S. Cristoloveanu, F. Y. Liu, B. H. Li, B. Li and J. Wan, “Unijunction Transistor Based on Silicon-on-insulator Substrate,” IWJT2020 (submitted). 

    3. X. Zhang, F. Y. Liu, B. Li, J. J. Luo, Z. S. Han, M. Arsalan, J. Wan and S. Cristoloveanu, “Pseudo-MOSFET transient behavior: experiments, model and substrate effect,” EuroSOI & ULIS 2020 (accepted). 

    4. M. Arsalan, J. Liu, A. Zaslavsky, S. Cristoloveanu, F. Y. Liu, B. H. Li, B. Li and J. Wan, “Suppressing crosstalk in the photoelectron in-situ sensing device (PISD) by double SOI,” EuroSOI & ULIS 2020 (accepted). 

    5. G. Q. Wang, F. Y. Liu, B. Li, Y. Huang, Y. C. Wang, C. N. Wu, J. M. Zhang, J. J. Luo, Z. S. Han and S. Cristoloveanu, “Revisited parasitic bipolar effect in FDSOI MOSFETs: Mechanism, current gain extraction and its circuit applications,” EuroSOI & ULIS 2020 (accepted). 

    6. F. Y. Zhang, F. Y. Liu, B. Li, B. H. Li, C. Yang, R. W. Wang, J. J. Luo and Z. S. Han, “The Current Model for FOI FinFETs with Back-Gate Bias,” EuroSOI & ULIS 2020 (accepted). 

    7. Y. Huang, F. Y. Liu, B. H. Li, B. Li, J. T. Gao, L. Wang, X. H. Su, H. N. Liu, Z. S. Han and J. J. Luo, “Radiation-induced Degradation Mechanism in Double-SOI pMOSFETs”, Proceedings of RADECS 2019, France. 

    8. M. S. Parihar, F. Y. Liu, C. Navarroa, S. Barraud, M. Bawedin, I. Ionica, A. Kranti and S. Cristoloveanu, “Back-gate effects and detailed characterization of junctionless transistor,” Proceedings of ESSDERC 2015, Wien, Austria, 2015, pp. 282~285. 

    9. F. Y. Liu, I. Ionica, M. Bawedin and S. Cristoloveanu, “A simple compact model for carrier distribution and its application in single-, double- and triple-gate junctionless transistors,” Proceedings of EuroSOI & ULIS, Bologna, Italy, 2015. 

    10. F. Y. Liu, I. Ionica, M. Bawedin and S. Cristoloveanu, “Effect of back-gate on parasitic bipolar effect in FD SOI MOSFETs,” Proceedings of IEEE S3S Conference, San Francisco, USA, 2014, pp. 85~86. 

    11. F. Y. Liu, I. Ionica, M. Bawedin and S. Cristoloveanu, “Parasitic bipolar effect in advanced FD SOI MOSFETs: experimental evidence and gain extraction,” Proceedings of EuroSOI 2014, Tarragona, Spain, 2014.  

    12. F. Y. Liu, L. Dicioccio, I. Ionica, Y. F. Guo and S. Cristoloveanu, “A New Extracting Method for Estimating the Bonding Quality of Metal Bonded Wafers,” Proceedings of EuroSOI 2013, Paris, France, 2013. 

    13. Y. F. Guo, F. Y. Liu, S. J. Chang, J. F. Yao and S. Cristoloveanu, “An analytical model of back-gate coupling effects in vertical double-gate SOI MOSFETs,” Proceeding of EuroSOI 2013, Paris, France, 2013. 

    14. F. Y. Liu, A. Diab, I. Ionica, K. Akarvardar, C. Hobbs, T. Ouisse, X. Mescot and S. Cristoloveanu, “Transport Properties in Heavily Doped SOI Wafers,” Proceeding of EuroSOI 2012, Montpellier, France, 2012. 

    15. S. Cristoloveanu, I. Ionica, A. Diab and F. Y. Liu, “The Pseudo-MOSFET : principles and recent trends,” (invited), 12th Int. Symposium on High Purity Silicon, 222nd Meeting of the Electrochemical Soc., Honolulu, Hawaii, USA, 2012. 

    16. C. Q. Xu, P. Batude, B. Sklenard, M. Vinet, M. Mouis, B. Previtali, F. Y. Liu, J. Guerrero, K. Yckache, P. Rivallin, V. Mazzocchi, S. Cristoloveanu, O. Faynot and T. Poiroux, “FDSOI: A solution to suppress boron deactivation in low temperature processed devices,” 12th International Workshop on Junction Technology (IWJT), Shanghai, 2012, pp. 69~72. 

    译著 

    1.《可靠性物理与工程-失效时间模型(第3版)》 

    2.《抗辐射集成电路设计》

    专利申请:

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    获奖及荣誉:

  • 1.   国防科学技术大学优秀毕业生,长沙,中国,2016 

    2.   湖南省优秀硕士学位论文,长沙,中国,2013 

    3.   国防科学技术大学优秀博士生创新资助,长沙,中国,2012 

    4.   国防科学技术大学优秀硕士学位论文,长沙,中国,2012