论文编号: 172511O120120094
第一作者所在部门: 九室一组
论文题目: 焊料包铜球填充法实现高频硅通孔填充
论文题目英文:
作者: 于大全
论文出处:
刊物名称: Journal of semiconductors
: 2012
:
: 33
: 086002-1
联系作者: 于大全
收录类别:
影响因子: 0.3209
摘要: A novel low-cost and high-speed via filling method using Cu-cored solder balls was investigated for through-silicon via manufacture.Cu-cored solder balls with a total diameter of 100 μm were used to fill 150 μm deep,110 μm wide vias in silicon.The wafer-level filling process can be completed in a few seconds,which is much faster than using the traditional electroplating process.Thermo-mechanical analysis of via filling using solder,Cu and Cu-cored solder was carried out to assess the thermo-mechanical properties of the different filling materials.It was found that the vias filled with Cu-cored solder exhibit less thermal-mechanical stresses than solder-filled vias,but more than Cu-filled vias.
英文摘要:
外单位作者单位:
备注: EI收录