| 论文编号: | 172511O120130112 |
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| 作者: | 景玉鹏 |
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| 刊物名称: | Microsystem technonogies |
| 年: | 2013-09-12 |
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| 期: | 1 |
| 页: | 1 |
| 联系作者: | 景玉鹏 |
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| 摘要: | A novel method based on electromagnetic wave(EW) was firstly proposed to dry photoresist with high aspect ratio after electron beam lithography. This method used EW to penetrate photoresist and heat the water stored between resist patterns directly, then the water evaporated with absorbing energy of EW. An array of 15,625 pillars and lines with 14.9 nm width of aspect ratio 13 and 17 respectivelywere dried successfully. By analyzing the heating mechanism, we demonstrated that the EW can decrease surfac tension of water effectively and may be applicable for cleaning via hole and the inner wall of carbon nanotubes. |
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