论文编号: 172511O120100208
第一作者所在部门: 二室四组
论文题目: 抗辐射加固256K CMOS SOI SRAM
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作者: 赵凯
论文出处: EI收录
刊物名称: 2010 10th International Conference on Solid-State and Integrated Circuit Technology, Proceedings
: 2010
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摘要: A radiation hardened 256K-bit asynchronous SRAM is presented. It is fabricated by a 0.5-micron, radiation hardened CMOS PDSOI process with 3 layers of metal. It features 800uA stand-by current, 42ns access time, 300K rad(Si) total dose tolerant and 1.5×1011rad (Si)/s dose rate survivability. A 28-pin DIP package is used. The circuit operates with ambient temperature from -55 to +125°C and power supply from 4.5 to 5.5V.
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