| 论文编号: | 172511O120120038 |
| 第一作者所在部门: | 八室一组 |
| 论文题目: | 基于氦等离子体浸没注入技术的石墨烯厚度的高精度调制 |
| 论文题目英文: | |
| 作者: | 李超波 |
| 论文出处: | |
| 刊物名称: | Nanotechnology |
| 年: | 2012 |
| 卷: | 23 |
| 期: | 37 |
| 页: | 375303 |
| 联系作者: | 李超波 |
| 收录类别: | |
| 影响因子: | 1.762 |
| 摘要: | In this paper we present a novel method of regulation to obtain graphene layers with homogeneous thickness by means of helium plasma implantation. The obtained graphene layers show neither large deep pits nor loss of lateral dimension. The etching rate can be precisely controlled (one to six atomic layers min？1 or higher) and it remains consistent regardless of the thickness of the multilayer graphene. This approach is compatible with traditional complementary metal–oxide–semiconductor fabrication technologies and has great potential to modulate the performance of graphene for device applications. |
| 英文摘要: | |
| 外单位作者单位: | |
| 备注: | SCI收录 |
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